Our Products

Advanced optical measurement and analysis systems designed for precision, reliability, and ease of use in demanding applications.

Deflection Analysis

DeflectionAnalyzer

The DeflectionAnalyzer measures and evaluates the angular change of a light beam during transmission through optical panes with spatial resolution. This advanced system enables precise characterization of optical components across their entire surface.

  • Spatial resolution for comprehensive surface analysis
  • High-precision measurement of beam deflection angles
  • Real-time data acquisition and analysis
  • Automated quality assessment with customizable criteria

Key Applications

  • Development and testing of LiDAR protective windows
  • Quality control in series production of optical components
  • Characterization of automotive glazing and displays
  • Research and development of advanced optical materials

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+/- 50 microradian Accuracy
5 um Resolution
LL
4" Version
6" Version
500nm Min Resolution
Photolithography

LithoLight

The LithoLight exposure and masking system is a compact, high-performance solution for photolithography applications. Available in 4" or 6" versions, it features an LED-based optical head providing collimated and homogeneous illumination.

  • LED-based optical head with collimated illumination
  • Masking function enabling resolutions down to 500 nm
  • Compatible with AZ, Shipley, SU-8, and K-CL series
  • Compact design for easy integration into production environments

Key Applications

  • Wafer-level photolithography and microfabrication
  • MEMS and optical sensor manufacturing
  • Photonics and waveguide fabrication
  • Research, prototyping, and small-batch production

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