Microelectronics Fabrication
Wafer-level photolithography, integrated circuit patterning, and multi-layer device fabrication.
LithoLight
Compact LED-based exposure and masking system for high-resolution photolithography with 500nm capability and universal photoresist compatibility.
4"
Version
6"
Version
500nm
Minimum Resolution
Photolithography
Advanced Exposure and Masking System
The LithoLight exposure and masking system is a compact, high-performance solution for photolithography applications. Available in 4" or 6" versions, it features an LED-based optical head providing collimated and homogeneous illumination.
- LED optical head with homogeneous illumination
- Masking function enabling resolutions down to 500 nm
- Compatible with AZ, Shipley, SU-8, and K-CL series
- Compact design for easy integration into production environments
LithoLight is suited for prototype development, photonics work, microfabrication, and small-batch manufacturing where consistent pattern fidelity matters.
Key Applications
MEMS & Sensors
High-precision patterning for MEMS device fabrication and optical sensor manufacturing.
Photonics & Optics
Optical element patterning, photonic device manufacturing, and waveguide fabrication.
Research & Prototyping
Flexible support for prototyping, nanotechnology research, and small-batch development workflows.
Compatible Photoresists
LithoLight works seamlessly with popular photoresist families, giving you flexibility across research and manufacturing workflows.
AZ Series
Positive & Negative
Positive & Negative
Shipley Series
Proven Performance
Proven Performance
SU-8
High-Aspect Ratio
High-Aspect Ratio
K-CL Series
Chemically Amplified
Chemically Amplified
Ready to Get Started?
Contact our team to discuss your photolithography requirements and discover how LithoLight can support your manufacturing process.
Contact Our Team